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1

Marxism, Literary Criticism, and the American Academic Scene

Journal:

Science & Society

Year:

1967

Language:

english

File:

PDF, 1.82 MB

english, 1967

2

Countercultures: The Promise and the Peril of a World Turned Upside Down.by J. Milton Yinger

Review by: Peter Clecak

Journal:

American Journal of Sociology

Year:

1984

Language:

english

File:

PDF, 291 KB

english, 1984

3

The Image Empire: A History of Broadcasting in the United States from 1953by Eric Barnouw

Review by: Peter Clecak

Journal:

Science & Society

Year:

1971

Language:

english

File:

PDF, 413 KB

english, 1971

4

Airborne contamination of a chemically amplified resist. 1. Identification of problem

MacDonald, Scott A., Hinsberg, William D., Wendt, H. Russell, Clecak, Nicholas J., Willson, C. Grant, Snyder, Clinton D.

Journal:

Chemistry of Materials

Year:

1993

Language:

english

File:

PDF, 4.85 MB

english, 1993

5

Design of a positive resist for projection lithography in the mid-UV

Grant Willson, Robert Miller, Dennis McKean, Nicholas Clecak, Terry Tompkins, Donald Hofer, Josef Michl, John Downing

Journal:

Polymer Engineering & Science

Year:

1983

Language:

english

File:

PDF, 663 KB

english, 1983

6

MORAL VERSUS MATERIAL INCENTIVES

Journal:

Social Theory and Practice

Year:

1970

Language:

english

File:

PDF, 1.71 MB

english, 1970

7

Airborne Contamination of a Chemically Amplified Resist. 2. Effect of Polymer Film Properties on Contamination Rate

Hinsberg, William D., MacDonald, Scott A., Clecak, Nicholas J., Snyder, Clinton D.

Journal:

Chemistry of Materials

Year:

1994

Language:

english

File:

PDF, 914 KB

english, 1994

8

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - 1X deep-UV lithography with chemical amplification for 1-micron DRAM production

Maltabes, John G., Holmes, Steven J., Morrow, James R., Barr, Roger L., Hakey, Mark C., Reynolds, Gregg, Brunsvold, William R., Willson, C. Grant, Clecak, Nicholas J., MacDonald, Scott A., Ito, Hirosh

Year:

1990

Language:

english

File:

PDF, 341 KB

english, 1990

9

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Influence of polymer properties on airborne chemical contamination of chemically amplified resists

Hinsberg, William D., MacDonald, Scott A., Clecak, Nicholas J., Snyder, Clinton D., Ito, Hiroshi, Hinsberg, William D.

Year:

1993

Language:

english

File:

PDF, 585 KB

english, 1993

10

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis

Hinsberg, William D., MacDonald, Scott A., Clecak, Nicholas J., Snyder, Clinton D., Novembre, Anthony E.

Year:

1992

Language:

english

File:

PDF, 625 KB

english, 1992

11

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Airborne chemical contamination of a chemically amplified resist

MacDonald, Scott A., Clecak, Nicholas J., Wendt, H. R., Willson, C. Grant, Snyder, Clinton D., Knors, C. J., Deyoe, N. B., Maltabes, John G., Morrow, James R., McGuire, Anne E., Holmes, Steven J., Ito

Year:

1991

Language:

english

File:

PDF, 1.07 MB

english, 1991

12

SPIE Proceedings [SPIE 1988 Microlithography Conferences - Santa Clara, CA (Wednesday 2 March 1988)] Advances in Resist Technology and Processing V - Novolac Based Deep-UV Resists

McKean, Dennis R., MacDonald, Scott A., Clecak, Nicholas J., Willson, C. Grant, MacDonald, Scott A.

Year:

1988

Language:

english

File:

PDF, 3.61 MB

english, 1988

13

Dilemmas of the American Left

Journal:

Social Research

Year:

1974

Language:

english

File:

PDF, 1.70 MB

english, 1974

14

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Molecular design for stabilization of chemical amplification resist toward airborne contamination

Ito, Hiroshi, England, William P., Clecak, Nicholas J., Breyta, Gregory, Lee, Hoosung, Yoon, Do Y., Sooriyakumaran, Ratnam, Hinsberg, William D., Hinsberg, William D.

Year:

1993

Language:

english

File:

PDF, 999 KB

english, 1993

15

Fundamental Studies of airborne chemical contamination of chemically amplified resists.

Hinsberg, W., MacDonald, S., Clecak, N., Snyder, C.

Journal:

Journal of Photopolymer Science and Technology

Year:

1993

Language:

english

File:

PDF, 435 KB

english, 1993

16

Thermal properties of 4-alkyl-4′-cyanotolanes: a new series of liquid crystals

Robert J. Cox, Richard C. Gaskill, Julian F. Johnson, Nicholas J. Clecak

Journal:

Thermochimica Acta

Year:

1977

Language:

english

File:

PDF, 362 KB

english, 1977

17

Thermal properties of 4-alkyl-4′-cyanostilbenes: a new series of liquid crystal compounds

Robert J. Cox, Richard C. Gaskill, Julian F. Johnson, Nicholas J. Clecak

Journal:

Thermochimica Acta

Year:

1977

Language:

english

File:

PDF, 354 KB

english, 1977

18

Azide photoresists for projection photolithography

N. J. Clecak, R. J. Cox, W. M. Moreau

Journal:

Polymer Engineering & Science

Year:

1974

Language:

english

File:

PDF, 261 KB

english, 1974

19

Polysilanes: Photochemistry and deep UV lithography

R. D. Miller, G. Wallraff, N. Clecak, R. Sooriyakumaran, J. Michl, T. Karatsu, A. J. McKinley, K. A. Klingensmith, J. Downing

Journal:

Polymer Engineering & Science

Year:

1989

Language:

english

File:

PDF, 497 KB

english, 1989

20

Resist system based on the cationic photocrosslinking of poly(4-hydroxystyrene) and polyfunctional electrophiles

J. T. Fahey, K. Shimizu, J. M. J. Fréchet, N. Clecak, C. G. Willson

Journal:

Journal of Polymer Science Part A: Polymer Chemistry

Year:

1993

Language:

english

File:

PDF, 1.09 MB

english, 1993

21

Deep UV photoresists I. Meldrum's diazo sensitizer

Grant, B.D., Clecak, N.J., Twieg, R.J., Willson, C.G.

Journal:

IEEE Transactions on Electron Devices

Year:

1981

Language:

english

File:

PDF, 993 KB

english, 1981

22

Synthesis and proof of structure of 2,6-diamino-benzo[1,2-d:4,5-d']bisthiazole

Solar, Samuel L., Cox, Robert J., Clecak, N. J., Ettinger, Raymond

Journal:

Journal of Organic Chemistry

Year:

1968

Language:

english

File:

PDF, 289 KB

english, 1968

23

Study of the electrochromism of methoxyfluorene compounds

Grant, Barbara, Clecak, N. J., Oxsen, Michael, Jaffe, Annette, Keller, G. S.

Journal:

Journal of Organic Chemistry

Year:

1980

Language:

english

File:

PDF, 555 KB

english, 1980

24

A positive tone plasma-developable resist obtained by gas-phase image reversal

MacDonald, Scott A., Schlosser, Hubert, Clecak, Nicholas J., Willson, C. Grant, Frechet, Jean M. J.

Journal:

Chemistry of Materials

Year:

1992

Language:

english

File:

PDF, 1.15 MB

english, 1992

25

Plasma developable photoresist systems based on chemical amplification

MacDonald, Scott A., Schlosser, Hubert, Ito, Hiroshi, Clecak, Nicholas J., Willson, C. Grant

Journal:

Chemistry of Materials

Year:

1991

Language:

english

File:

PDF, 2.64 MB

english, 1991

26

Characterization of a Novolak-based three-component deep-UV resist

McKean, Dennis R., MacDonald, Scott A., Johnson, Robert D., Clecak, Nicholas J., Willson, C. Grant

Journal:

Chemistry of Materials

Year:

1990

Language:

english

File:

PDF, 1.55 MB

english, 1990

27

The Preparation of 4-Cyano-4′-Alkyltolans: A New Series of Liquid Crystals

Cox, R. J., Clecak, N. J.

Journal:

Molecular Crystals and Liquid Crystals

Year:

1976

Language:

english

File:

PDF, 382 KB

english, 1976

28

The Preparationof 4-Alkyl-4′-Cyanostilbenes :A New Series of Liquid Crystal Compounds

Cox, R. J., Clecak, N. J.

Journal:

Molecular Crystals and Liquid Crystals

Year:

1976

Language:

english

File:

PDF, 257 KB

english, 1976

29

Novel Liquid Crystalline Materials: Synthesis and preliminary characterization of new 4,4′-disubstituted diphenyldiacetylene, tolane and stilbene derivatives

Grant, Barbara, Clecak, N. J., Cox, R. J.

Journal:

Molecular Crystals and Liquid Crystals

Year:

1979

Language:

english

File:

PDF, 269 KB

english, 1979

30

Radical Paradoxes: Dilemmas of the American Left: 1945-1970

Lane, Ann J., Clecak, Peter

Journal:

The American Historical Review

Year:

1975

Language:

english

File:

PDF, 353 KB

english, 1975

31

C. Wright Mills

Clecak, Peter, Press, Howard

Journal:

The Journal of American History

Year:

1979

Language:

english

File:

PDF, 122 KB

english, 1979

32

The Sea Change: The Migration of Social Thought, 1930-1965

Clecak, Peter, Hughes, H. Stuart

Journal:

The Journal of American History

Year:

1975

Language:

english

File:

PDF, 128 KB

english, 1975

33

Radical Paradoxes: Dilemmas of the American Left, 1945-1970

O'Neill, William L., Clecak, Peter

Journal:

The Journal of American History

Year:

1974

Language:

english

File:

PDF, 127 KB

english, 1974

34

Notes on Work

Journal:

The Antioch Review

Year:

1978

Language:

english

File:

PDF, 2.76 MB

english, 1978

35

The Snare of Preparation

Journal:

The American Scholar

Year:

1969

Language:

english

File:

PDF, 911 KB

english, 1969

36

Technical Writingby Richard W. Smith

Review by: Pete Clecak

Journal:

College Composition and Communication

Year:

1965

Language:

english

File:

PDF, 314 KB

english, 1965

37

The Revolution Delayed: The Political and Cultural Revolutionaries in America

Journal:

The Massachusetts Review

Year:

1971

Language:

english

File:

PDF, 3.26 MB

english, 1971

38

"The Movement" and Its Legacy

Journal:

Social Research

Year:

1981

Language:

english

File:

PDF, 2.56 MB

english, 1981

39

Reconsiderations: The Irrelevant English Teacher by J. Mitchell Morse

Journal:

Change The Magazine of Higher Learning

Year:

1975

Language:

english

File:

PDF, 1.78 MB

english, 1975

40

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Polysilanes for microlithography

Wallraff, Gregory M., Miller, Robert D., Clecak, Nicholas J., Baier, M., Ito, Hiroshi

Year:

1991

Language:

english

File:

PDF, 651 KB

english, 1991

41

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Highly etch resistant, negative resist for deep-UV and electron beam lithography

McKean, Dennis R., Clecak, Nicholas J., Pederson, Sr., Lester A., Watts, Michael P. C.

Year:

1990

Language:

english

File:

PDF, 839 KB

english, 1990

42

SPIE Proceedings [SPIE Optical Data Storage - Vancouver, Canada (Monday 5 March 1990)] Optical Data Storage - Generation of optical disk servo patterns by lithographic imaging of photodeformable polymers

Brock, Phillip J., Willson, C. Grant, Swalen, Jerome D., Jurich, Mark C., Miller, Robert D., Clecak, Nicholas J., Logan, Anthony, Frechet, Jean M. J., Carlin, Donald B., Kay, David B.

Year:

1990

Language:

english

File:

PDF, 632 KB

english, 1990

43

SPIE Proceedings [SPIE 1986 Microlithography Conferences - Santa Clara (Monday 10 March 1986)] Advances in Resist Technology and Processing III - A 2-Layer Resist System Derived From Trimethylsilylstyrene

MacDonald, S. A., Allen, R. D., Clecak, N. J., Willson, C. G., Frechet, J. M., Willson, C. Grant

Year:

1986

Language:

english

File:

PDF, 2.98 MB

english, 1986

44

Reconsiderations

Review by: Peter Clecak

Journal:

Change The Magazine of Higher Learning

Year:

1975

Language:

english

File:

PDF, 673 KB

english, 1975

45

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Positive-tone dry-develop resist based on crosslinking a phenolic resin

MacDonald, Scott A., Larson, Carl E., Schlosser, Hubert, Brock, Phillip J., Clecak, Nicholas J., Frechet, Jean M. J., Hinsberg, William D.

Year:

1993

Language:

english

File:

PDF, 714 KB

english, 1993

46

Approach toward environmental stabilization of chemical amplification resists.

ITO, Hiroshi, ENGLAND, William P., SOORIYAKUMARAN, R., CLECAK, Nicholas J., BREYTA, Gregory, HINSBERG, William D., LEE, Hoosung, YOON, Do Y.

Journal:

Journal of Photopolymer Science and Technology

Year:

1993

Language:

english

File:

PDF, 730 KB

english, 1993

47

Plasma developable photoresist systems based on chemical amplification.

MacDonald, S. A., Schlosser, H., Ito, H., Clecak, N. J., Willson, C. G.

Journal:

Journal of Photopolymer Science and Technology

Year:

1991

Language:

english

File:

PDF, 404 KB

english, 1991

48

ChemInform Abstract: ORDER AND FLOW IN LIQUID CRYSTALS. PART XLVI. THERMAL PROPERTIES OF 4-ALKYL-4′-CYANOTOLANES- A NEW SERIES OF LIQUID CRYSTALS

COX, R. J., GASKILL, R. C., JOHNSON, J. F., CLECAK, N. J.

Journal:

Chemischer Informationsdienst

Year:

1977

File:

PDF, 122 KB

1977

49

ChemInform Abstract: STUDY OF THE ELECTROCHROMISM OF METHOXYFLUORENE COMPOUNDS

GRANT, B., CLECAK, N. J., OXSEN, M., JAFFE, A., KELLER, G. S.

Journal:

Chemischer Informationsdienst

Year:

1980

File:

PDF, 191 KB

1980